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1

Allegations of Sexual Abuse in Satanic Rituals

J.S. La Fontaine

Journal:

Year:

1994

File:

PDF, 165 KB

1994

2

Integrated outcrop and subsurface geomodeling of the Turonian Wall Creek Member of the Frontier Formation, Powder River Basin, Wyoming, USA

La Fontaine, Nathan M., Le, Tuan, Hoffman, Todd, Hofmann, Michael H.

Journal:

Marine and Petroleum Geology

Year:

2021

File:

PDF, 37.57 MB

2021

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Proposal for determining exposure latitude requirements

Levinson, Harry J., Ma, Yuansheng, Koenig, Marcel, La Fontaine, Bruno, Seltmann, Rolf

Year:

2008

Language:

english

File:

PDF, 371 KB

english, 2008

4

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Fomenkov, Igor, Brandt, David, Ershov, Alex, Schafgans, Alexander, Tao, Yezheng, Vaschenko, Georgiy, Rokitski, Slava, Kats, Michael, Vargas, Michael, Purvis, Michael, Rafac, Rob, La Fontaine, Bruno, D

Journal:

Advanced Optical Technologies

Language:

english

File:

PDF, 1.06 MB

english

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Performance of the ASML EUV Alpha Demo Tool

Hermans, Jan V., Hendrickx, Eric, Laidler, David, Jehoul, Christiane, Van Den Heuvel, Dieter, Goethals, Anne-Marie, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.65 MB

english, 2010

6

Risk factors for methicillin-resistant Staphylococcus aureus in diabetic foot infections

Lavery, Lawrence A., La Fontaine, Javier, Bhavan, Kavita, Kim, Paul J., Williams, Jayme R., Hunt, Nathan A.

Journal:

Diabetic Foot & Ankle

Year:

2014

Language:

english

File:

PDF, 240 KB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Towards defect free EUVL reticles: carbon and particle removal by single dry cleaning proces and pattern repair by HIM

Koster, N. B., La Fontaine, Bruno M., Naulleau, Patrick P., Molkenboer, F. T., van Veldhoven, E., Oostrom, S.

Year:

2011

Language:

english

File:

PDF, 19.54 MB

english, 2011

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic phase defect detection and printability analysis for patterned EUVL mask

La Fontaine, Bruno M., Terasawa, Tsuneo, Yamane, Takeshi, Tanaka, Toshihiko, Suga, Osamu, Kamo, Takashi, Mori, Ichiro

Year:

2010

Language:

english

File:

PDF, 2.52 MB

english, 2010

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

La Fontaine, Bruno M., Blakey, Idriss, Yu, Anguang, Blinco, James, Jack, Kevin S., Liu, Heping, Leeson, Michael, Yueh, Wang, Younkin, Todd, Whittaker, Andrew K.

Year:

2010

Language:

english

File:

PDF, 693 KB

english, 2010

10

Conservative Offloading

Crisologo, Peter A., Lavery, Lawrence A., Fontaine, Javier La

Journal:

Clinics in Podiatric Medicine and Surgery

Year:

2019

Language:

english

File:

PDF, 1.51 MB

english, 2019

11

An experimental study of a broadband active attenuator for cancellation of random noise in ducts

R.F. La Fontaine, I.C. Shepherd

Journal:

Journal of Sound and Vibration

Year:

1983

Language:

english

File:

PDF, 788 KB

english, 1983

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Directly patterned inorganic hardmask for EUV lithography

Stowers, Jason K., Telecky, Alan, Kocsis, Michael, Clark, Benjamin L., Keszler, Douglas A., Grenville, Andrew, Anderson, Chris N., Naulleau, Patrick P., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 3.85 MB

english, 2011

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic imaging of native and programmed defects on a full-field mask

Mochi, I., Goldberg, K. A., La Fontaine, B., Tchikoulaeva, A., Holfeld, C., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.46 MB

english, 2010

14

Gerard Thibault and his Academie de l'espée

De La Fontaine Verwey, Herman

Journal:

Year:

1978

Language:

english

File:

PDF, 27.10 MB

english, 1978

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Mochi, Iacopo, La Fontaine, Bruno M., Naulleau, Patrick P., Goldberg, Kenneth A., Xie, Ryan, Yan, Pei-Yang, Yamazoe, Kenji

Year:

2011

Language:

english

File:

PDF, 3.97 MB

english, 2011

16

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists

Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 910 KB

english, 2007

17

Demonic Possession and Exorcism in Early Modern Franceby Sarah Ferber

Review by: Jean La Fontaine

Journal:

Nova Religio The Journal of Alternative and Emergent Religions

Year:

2010

Language:

english

File:

PDF, 107 KB

english, 2010

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

La Fontaine, Bruno M., Huh, Sungmin, Ren, Liping, Chan, David, Wurm, Stefan, Goldberg, Kenneth, Mochi, Iacopo, Nakajima, Toshio, Kishimoto, Masahiro, Ahn, Byungsup, Kang, Inyong, Park, Joo-on, Cho, Ky

Year:

2010

Language:

english

File:

PDF, 977 KB

english, 2010

19

3. Organized and Ritual Abuse

La Fontaine, J S

Journal:

Medicine Science and the Law

Year:

1996

Language:

english

File:

PDF, 760 KB

english, 1996

20

Scoring Mental Health Quality of Life With the SF-36 in Patients With and Without Diabetes Foot Complications

Ahn, Junho, Del Core, Michael A., Wukich, Dane K., Liu, George T., Lalli, Trapper, VanPelt, Michael D., La Fontaine, Javier, Lavery, Lawrence A., Raspovic, Katherine M.

Journal:

International Journal of Lower Extremity Wounds

Year:

2018

Language:

english

File:

PDF, 135 KB

english, 2018

21

Antibiotic prescribing and outcomes in cancer patients with febrile neutropenia in the emergency department

Peyrony, Olivier, Gerlier, Camille, Barla, Imola, Ellouze, Sami, Legay, LÃ©a, Azoulay, Elie, Chevret, Sylvie, Fontaine, Jean-Paul, Moreira, JosÃ©

Journal:

Year:

2020

Language:

english

File:

PDF, 482 KB

english, 2020

22

Characteristics of Adult Flatfoot in the United States

Naohiro Shibuya, Daniel C. Jupiter, Louis J. Ciliberti, Vincent VanBuren, Javier La Fontaine

Journal:

The Journal of Foot and Ankle Surgery

Year:

2010

Language:

english

File:

PDF, 143 KB

english, 2010

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Optics for EUV production

Lowisch, Martin, Kuerz, Peter, Mann, Hans-Juergen, Natt, Oliver, Thuering, Bernd, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 1.81 MB

english, 2010

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Overlay progress in EUV lithography towards adoption for manufacturing

Hermans, Jan V., Laidler, David, Pigneret, Charles, van Dijk, Andre, Voznyi, Oleg, Dusa, Mircea, Hendrickx, Eric, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.84 MB

english, 2011

25

LES CARACTÈRES DE CIVILITÉ ET LA PROPAGANDE RELIGIEUSE

H. de La Fontaine Verwey

Journal:

Bibliothèque d'Humanisme et Renaissance

Year:

1964

Language:

french

File:

PDF, 1.76 MB

french, 1964

26

The Power of Rights

Jean la Fontaine

Journal:

Year:

1977

Language:

english

File:

PDF, 2.17 MB

english, 1977

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of resist material and process for hp-2x-nm devices using EUV lithography

Matsunaga, Kentaro, Oizumi, Hiroaki, Kaneyama, Koji, Shiraishi, Gousuke, Matsumaro, Kazuyuki, Santillan, Julius Joseph, Itani, Toshiro, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 6.85 MB

english, 2010

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing

Chan, Y. David, Rastegar, Abbas, Yun, Henry, Putna, E. Steve, Wurm, Stefan, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 511 KB

english, 2010

29

International Encyclopedia of the Social & Behavioral Sciences || Family: The Anthropology of the Concept and Its History

La Fontaine, Jean

Year:

2015

Language:

english

File:

PDF, 104 KB

english, 2015

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

Putna, E. Steve, Younkin, Todd R., Leeson, Michael, Caudillo, Roman, Bacuita, Terence, Shah, Uday, Chandhok, Manish, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 1.86 MB

english, 2011

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - An investigation of EUV lithography defectivity

Cummings, Kevin D., Laursen, Thomas, Pierson, Bill, Han, Sang-in, Watso, Robert, van Dommelen, Youri, Lee, Brian, Deng, Yunfei, La Fontaine, Bruno, Wallow, Thomas, Okoroanyanwu, Uzo, Wood, Obert, Tchi

Year:

2008

Language:

english

File:

PDF, 2.14 MB

english, 2008

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV flare and proximity modeling and model-based correction

Zuniga, Christian, Habib, Mohamed, Word, James, Lorusso, Gian F., Hendrickx, Eric, Baylav, Burak, Chalasani, Raghu, Lam, Michael, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 3.56 MB

english, 2011

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of EUV resist for 22nm half pitch and beyond

Maruyama, Ken, Shimizu, Makoto, Hirai, Yuuki, Nishino, Kouta, Kimura, Tooru, Kai, Toshiyuki, Goto, Kentaro, Sharma, Shalini, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 722 KB

english, 2010

34

The Political System of Brazil || Brazil’s Foreign Policy: Between Self-Determination and Dependency

de la Fontaine, Dana, Stehnken, Thomas

Year:

2016

Language:

english

File:

PDF, 247 KB

english, 2016

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Scissionable polymer resists for extreme ultraviolet lithography

Ogata, Yoichi, Masson, Georgeta, Hishiro, Yoshi, Blackwell, James M., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 1.26 MB

english, 2010

36

The first 'book of etiquette' for children

De La Fontaine Verwey, H.

Journal:

Year:

1971

Language:

english

File:

PDF, 2.54 MB

english, 1971

37

Digging deep: how organisational culture affects care home residents' experiences – ERRATUM

KILLETT, ANNE, BURNS, DIANE, KELLY, FIONA, BROOKER, DAWN, BOWES, ALISON, FONTAINE, JENNY LA, LATHAM, ISABELLE, WILSON, MICHAEL, O'NEILL, MARTIN

Journal:

Ageing and Society

Year:

2016

Language:

english

File:

PDF, 25 KB

english, 2016

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

La Fontaine, Bruno M., Kim, Eun-Jin, You, Jee-Hye, Kim, Seoung-Sue, Cho, Han-Ku, Ahn, Jinho, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 2.76 MB

english, 2010

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Time resolved studies of laser-produced plasmas of tin

La Fontaine, Bruno M., McCormack, T., Scally, E., Kambalii, I.

Year:

2010

Language:

english

File:

PDF, 1.95 MB

english, 2010

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Measuring resist-induced contrast loss using EUV interference lithography

La Fontaine, Bruno M., Langner, Andreas, Solak, Harun H., Gronheid, Roel, van Setten, Eelco, Auzelyte, Vaida, Ekinci, Yasin, van Ingen Schenau, Koen, Feenstra, Kees

Year:

2010

Language:

english

File:

PDF, 1.91 MB

english, 2010

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Assessing out-of-band flare effects at the wafer level for EUV lithography

La Fontaine, Bruno M., George, Simi A., Naulleau, Patrick P., Kemp, Charles D., Denham, Paul E., Rekawa, Senajith

Year:

2010

Language:

english

File:

PDF, 5.36 MB

english, 2010

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

La Fontaine, Bruno M., Aoyama, Hajime, Tanaka, Yuusuke, Tawarayama, Kazuo, Nakamura, Naofumi, Soda, Eiichi, Oda, Noriaki, Arisawa, Yukiyasu, Uno, Taiga, Kamo, Takashi, Matsunaga, Kentaro, Kawamura, Da

Year:

2010

Language:

english

File:

PDF, 4.46 MB

english, 2010

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorption and loss of film thickness in photoresists and underlayer materials upon irradiation at 13.5 nm

La Fontaine, Bruno M., Ho, Grace H., Kang, Fu-H., Fu, Huang-W., Shih, Yu-H., Fung, Hok-S., Ku, Wan-P., Cheng, Yu-S., Wu, Pei-J.

Year:

2010

Language:

english

File:

PDF, 611 KB

english, 2010

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Comprehensive EUV lithography model

Smith, Mark D., La Fontaine, Bruno M., Naulleau, Patrick P., Graves, Trey, Biafore, John, Robertson, Stewart, Kim, Cheolkyun, Moon, James, Kim, Jaeheon, Bok, Cheolkyu, Yim, Donggyu

Year:

2011

Language:

english

File:

PDF, 808 KB

english, 2011

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Physical resist models and their calibration: their readiness for accurate EUV lithography simulation

La Fontaine, Bruno M., Klostermann, U. K., Mülders, T., Schmöller, T., Lorusso, G. F., Hendrickx, E.

Year:

2010

Language:

english

File:

PDF, 1.30 MB

english, 2010

46

Child Sexual Abuse and the Incest Taboo: Practical Problems and Theoretical Issues

J. S. La Fontaine

Journal:

Year:

1988

Language:

english

File:

PDF, 1.69 MB

english, 1988

47

Taveta Customs and Beliefs in Connection with Religion, Burial, and Disease

S. H. La Fontaine

Journal:

Journal of the Royal African Society

Year:

1914

Language:

english

File:

PDF, 727 KB

english, 1914

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Assessing EUV mask defectivity

La Fontaine, Bruno M., Okoroanyanwu, Uzodinma, Tchikoulaeva, Anna, Ackmann, Paul, Wood, Obert, La Fontaine, Bruno, Bubke, Karsten, Holfeld, Christian, Peters, Jan Hendrik, Kini, Sumanth, Watson, Sterl

Year:

2010

Language:

english

File:

PDF, 1.05 MB

english, 2010

49

Contemporary Religious Satanism: A Critical Anthologyby Jesper Aagaard Petersen

Review by: Jean La Fontaine

Journal:

Nova Religio The Journal of Alternative and Emergent Religions

Year:

2010

Language:

english

File:

PDF, 123 KB

english, 2010

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Kamo, Takashi, La Fontaine, Bruno M., Naulleau, Patrick P., Terasawa, Tsuneo, Yamane, Takeshi, Shigemura, Hiroyuki, Takagi, Noriaki, Amano, Tsuyoshi, Tawarayama, Kazuo, Nozoe, Mari, Tanaka, Toshihiko,

Year:

2011

Language:

english

File:

PDF, 8.44 MB

english, 2011

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